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DEPOSITION OF THE STOICHIOMETRIC COATINGS BY REACTIVE MAGNETRON SPUTTERING
  • Alex Sagalovich,
  • S Dudnik,
  • Vladislav Sagalovych
Alex Sagalovich
Pjsc Fed

Corresponding Author:a_v_sagalovich@mail.com

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S Dudnik
NSC "KIPT" (Kharkiv
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Vladislav Sagalovych
Stc Nanotechnology
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Abstract

The investigations of the reactive magnetron depositing of the stoichiometric coatings “metal-metalloid” were done. The dependences between sputtering parameters of a target and processes of plasmochemical formation on the surface of sample “metal-metalloid” and formations of coatings of the appropriate structure were investigated. Experimental data on stoichiometric coatings AlN, Al 2 O 3 , TiN, TiO 2 is given. Features of reactive magnetron deposition and investigation results for obtaining of coatings with pregiven properties in particular for providing stability and controllability of coating deposition processes in time.