Abstract
The investigations of the reactive magnetron depositing of the
stoichiometric coatings “metal-metalloid” were done. The dependences
between sputtering parameters of a target and processes of
plasmochemical formation on the surface of sample “metal-metalloid”
and formations of coatings of the appropriate structure were
investigated. Experimental data on stoichiometric coatings AlN, Al 2 O 3
, TiN, TiO 2 is given. Features of reactive magnetron deposition and
investigation results for obtaining of coatings with pregiven properties
in particular for providing stability and controllability of coating
deposition processes in time.