3.3. Photoresist
As the key of photolithography, photoresist refers to thin film
materials whose solubility and adhesion change significantly after
exposure by light sources, then the micro-patterns can be obtained
through development, etching and other
processes.[97] It is widely employed in the fields
of printed circuit boards (PCB),[98-100] display
device,[101-103] integrated
circuit,[104] and other fine graphics processing.
Photoresist can be divided into positive photoresist and negative
photoresist on the basis of the area retained after development, in
which negative photoresist is photocurable materials. The schematic
diagram of photolithography is shown in Figure
27.[97]